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Pattern SiO₂ #53

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opened 2025-05-24 10:22:23 +00:00 by q3k · 1 comment
q3k commented 2025-05-24 10:22:23 +00:00
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Microfabrication process for getting features etched out of silicon oxide grown on silicon substrate, eg. to expose active areas.

There are three main steps to this:

  1. Growing a layer of SiO₂ using #54
  2. Adding a lithography mask using #62
  3. Etching away the exposed areas of SiO₂ using #5
Microfabrication process for getting features etched out of silicon oxide grown on silicon substrate, eg. to expose active areas. There are three main steps to this: 1. Growing a layer of SiO₂ using #54 2. Adding a lithography mask using #62 3. Etching away the exposed areas of SiO₂ using #5
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 label 2025-05-24 10:22:23 +00:00
forgejo-actions commented 2025-05-24 10:22:29 +00:00
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Partial Techtree

flowchart BT

    classDef eoi fill:#fff, stroke:#000, color:#000;
    classDef dependant fill:#fff, stroke:#888, color:#888;
    classDef dep_missing fill:#fcc, stroke:#800, color:#000;
    classDef dep_assigned fill:#ffa, stroke:#a50, color:#000;
    classDef dep_completed fill:#afa, stroke:#080, color:#000;
    0:::eoi
    0["#53 | MISSING<br/><i>Process</i><br/><b>Pattern SiO₂</b>"]
    1:::dep_missing
    1["#62 | MISSING<br/><i>Process</i><br/><b>Lithography</b>"]
    2:::dep_missing
    2["#70 | MISSING<br/><i>Research</i><br/><b>STM Lithography</b>"]
    3:::dep_assigned
    3["#49 | ASSIGNED<br/><i>Development</i><br/><b>Spin Coater</b>"]
    4:::dep_assigned
    4["#43 | ASSIGNED<br/><i>Development</i><br/><b>Scanning Tunneling Microscope (STM)</b>"]
    5:::dep_missing
    5["#88 | MISSING<br/><i>Development</i><br/><b>Piezo Slider Actuators</b>"]
    6:::dep_missing
    6["#108 | MISSING<br/><i>Development</i><br/><b>Piezo Driver</b>"]
    7:::dep_missing
    7["#81 | MISSING<br/><i>Process</i><br/><b>Interferometry</b>"]
    8:::dep_assigned
    8["#86 | ASSIGNED<br/><i>Development</i><br/><b>Optomechanical System</b>"]
    9:::dep_completed
    9["#64 | COMPLETED<br/><i>Equipment</i><br/><b>FFF 3D-Printer</b>"]
    10:::dep_missing
    10["#82 | MISSING<br/><i>Equipment</i><br/><b>Coherent Light Source</b>"]
    11:::dep_missing
    11["#87 | MISSING<br/><i>Equipment</i><br/><b>Diode Laser</b>"]
    12:::dep_assigned
    12["#85 | ASSIGNED<br/><i>Development</i><br/><b>Laser Diode Driver/Controller</b>"]
    13:::dep_missing
    13["#84 | MISSING<br/><i>Equipment</i><br/><b>Stabilized Helium-Neon Laser</b>"]
    14:::dep_missing
    14["#83 | MISSING<br/><i>Equipment</i><br/><b>External Cavity Diode Laser (ECDL)</b>"]
    15:::dep_completed
    15["#42 | COMPLETED<br/><i>Development</i><br/><b>STM Vibration Isolation</b>"]
    16:::dep_missing
    16["#51 | MISSING<br/><i>Process</i><br/><b>Maskless Photolithography</b>"]
    17:::dep_missing
    17["#52 | MISSING<br/><i>Development</i><br/><b>Maskless photolithography stepper</b>"]
    18:::dep_missing
    18["#50 | MISSING<br/><i>Process</i><br/><b>E-beam Lithography</b>"]
    19:::dep_missing
    19["#35 | MISSING<br/><i>Equipment</i><br/><b>SEM Beam Blanker</b>"]
    20:::dep_completed
    20["#28 | COMPLETED<br/><i>Equipment</i><br/><b>Scanning Electron Microscope (SEM)</b>"]
    21:::dep_completed
    21["#26 | COMPLETED<br/><i>Equipment</i><br/><b>Water Cooling</b>"]
    22:::dep_missing
    22["#54 | MISSING<br/><i>Process</i><br/><b>Si Thermal Oxidation</b>"]
    23:::dep_assigned
    23["#55 | ASSIGNED<br/><i>Equipment</i><br/><b>Tube Furnace</b>"]
    24:::dep_missing
    24["#21 | MISSING<br/><i>Process</i><br/><b>Reactive Ion Etching</b>"]
    25:::dep_missing
    25["#25 | MISSING<br/><i>Equipment</i><br/><b>Plasma Etcher</b>"]
    26:::dep_assigned
    26["#27 | ASSIGNED<br/><i>Equipment</i><br/><b>Technical Ventilation</b>"]
    27:::dep_completed
    27["#24 | COMPLETED<br/><i>Equipment</i><br/><b>~3ph Power (below 10kW)</b>"]
    28:::dep_missing
    28["#5 | MISSING<br/><i>Process</i><br/><b>BOE Etching</b>"]
    29:::dep_assigned
    29["#4 | ASSIGNED<br/><i>Equipment</i><br/><b>Wet Lab (Chemistry)</b>"]
    30:::dep_assigned
    30["#68 | ASSIGNED<br/><i>Equipment</i><br/><b>Heating Stirrer</b>"]
    31:::dep_missing
    31["#67 | MISSING<br/><i>Equipment</i><br/><b>Chemical Storage/Containment</b>"]
    32:::dep_missing
    32["#23 | MISSING<br/><i>Equipment</i><br/><b>Fume Hood</b>"]
    33:::dependant
    33["#61 | MISSING<br/><i>Process</i><br/><b>Zeloof Z1 process</b>"]
    34:::dependant
    34["#100 | MISSING<br/><i>Process</i><br/><b>Etch fractals on wafers</b>"]
    5 --> 6
    11 --> 12
    8 --> 9
    14 --> 11
    10 --> 14
    10 --> 13
    10 --> 11
    7 --> 10
    7 --> 8
    2 --> 4
    2 --> 3
    31 --> 26
    1 --> 18
    1 --> 16
    1 --> 2
    22 --> 23
    0 --> 28
    0 --> 24
    0 --> 22
    0 --> 1
    16 --> 3
    16 --> 17
    18 --> 19
    18 --> 3
    4 --> 15
    4 --> 7
    4 --> 5
    19 --> 20
    20 --> 21
    25 --> 27
    25 --> 26
    32 --> 26
    24 --> 25
    28 --> 29
    29 --> 32
    29 --> 26
    29 --> 31
    29 --> 30
    33 --> 0
    34 --> 0

Digest: f74a814b00faa93fdabbe6ec9f1700e5101ea87ca13a7f69407bbe6f38ac79bb; Last Updated: 2025-10-07 04:10:19

## Partial Techtree ```mermaid flowchart BT classDef eoi fill:#fff, stroke:#000, color:#000; classDef dependant fill:#fff, stroke:#888, color:#888; classDef dep_missing fill:#fcc, stroke:#800, color:#000; classDef dep_assigned fill:#ffa, stroke:#a50, color:#000; classDef dep_completed fill:#afa, stroke:#080, color:#000; 0:::eoi 0["#53 | MISSING<br/><i>Process</i><br/><b>Pattern SiO₂</b>"] 1:::dep_missing 1["#62 | MISSING<br/><i>Process</i><br/><b>Lithography</b>"] 2:::dep_missing 2["#70 | MISSING<br/><i>Research</i><br/><b>STM Lithography</b>"] 3:::dep_assigned 3["#49 | ASSIGNED<br/><i>Development</i><br/><b>Spin Coater</b>"] 4:::dep_assigned 4["#43 | ASSIGNED<br/><i>Development</i><br/><b>Scanning Tunneling Microscope (STM)</b>"] 5:::dep_missing 5["#88 | MISSING<br/><i>Development</i><br/><b>Piezo Slider Actuators</b>"] 6:::dep_missing 6["#108 | MISSING<br/><i>Development</i><br/><b>Piezo Driver</b>"] 7:::dep_missing 7["#81 | MISSING<br/><i>Process</i><br/><b>Interferometry</b>"] 8:::dep_assigned 8["#86 | ASSIGNED<br/><i>Development</i><br/><b>Optomechanical System</b>"] 9:::dep_completed 9["#64 | COMPLETED<br/><i>Equipment</i><br/><b>FFF 3D-Printer</b>"] 10:::dep_missing 10["#82 | MISSING<br/><i>Equipment</i><br/><b>Coherent Light Source</b>"] 11:::dep_missing 11["#87 | MISSING<br/><i>Equipment</i><br/><b>Diode Laser</b>"] 12:::dep_assigned 12["#85 | ASSIGNED<br/><i>Development</i><br/><b>Laser Diode Driver/Controller</b>"] 13:::dep_missing 13["#84 | MISSING<br/><i>Equipment</i><br/><b>Stabilized Helium-Neon Laser</b>"] 14:::dep_missing 14["#83 | MISSING<br/><i>Equipment</i><br/><b>External Cavity Diode Laser (ECDL)</b>"] 15:::dep_completed 15["#42 | COMPLETED<br/><i>Development</i><br/><b>STM Vibration Isolation</b>"] 16:::dep_missing 16["#51 | MISSING<br/><i>Process</i><br/><b>Maskless Photolithography</b>"] 17:::dep_missing 17["#52 | MISSING<br/><i>Development</i><br/><b>Maskless photolithography stepper</b>"] 18:::dep_missing 18["#50 | MISSING<br/><i>Process</i><br/><b>E-beam Lithography</b>"] 19:::dep_missing 19["#35 | MISSING<br/><i>Equipment</i><br/><b>SEM Beam Blanker</b>"] 20:::dep_completed 20["#28 | COMPLETED<br/><i>Equipment</i><br/><b>Scanning Electron Microscope (SEM)</b>"] 21:::dep_completed 21["#26 | COMPLETED<br/><i>Equipment</i><br/><b>Water Cooling</b>"] 22:::dep_missing 22["#54 | MISSING<br/><i>Process</i><br/><b>Si Thermal Oxidation</b>"] 23:::dep_assigned 23["#55 | ASSIGNED<br/><i>Equipment</i><br/><b>Tube Furnace</b>"] 24:::dep_missing 24["#21 | MISSING<br/><i>Process</i><br/><b>Reactive Ion Etching</b>"] 25:::dep_missing 25["#25 | MISSING<br/><i>Equipment</i><br/><b>Plasma Etcher</b>"] 26:::dep_assigned 26["#27 | ASSIGNED<br/><i>Equipment</i><br/><b>Technical Ventilation</b>"] 27:::dep_completed 27["#24 | COMPLETED<br/><i>Equipment</i><br/><b>~3ph Power (below 10kW)</b>"] 28:::dep_missing 28["#5 | MISSING<br/><i>Process</i><br/><b>BOE Etching</b>"] 29:::dep_assigned 29["#4 | ASSIGNED<br/><i>Equipment</i><br/><b>Wet Lab (Chemistry)</b>"] 30:::dep_assigned 30["#68 | ASSIGNED<br/><i>Equipment</i><br/><b>Heating Stirrer</b>"] 31:::dep_missing 31["#67 | MISSING<br/><i>Equipment</i><br/><b>Chemical Storage/Containment</b>"] 32:::dep_missing 32["#23 | MISSING<br/><i>Equipment</i><br/><b>Fume Hood</b>"] 33:::dependant 33["#61 | MISSING<br/><i>Process</i><br/><b>Zeloof Z1 process</b>"] 34:::dependant 34["#100 | MISSING<br/><i>Process</i><br/><b>Etch fractals on wafers</b>"] 5 --> 6 11 --> 12 8 --> 9 14 --> 11 10 --> 14 10 --> 13 10 --> 11 7 --> 10 7 --> 8 2 --> 4 2 --> 3 31 --> 26 1 --> 18 1 --> 16 1 --> 2 22 --> 23 0 --> 28 0 --> 24 0 --> 22 0 --> 1 16 --> 3 16 --> 17 18 --> 19 18 --> 3 4 --> 15 4 --> 7 4 --> 5 19 --> 20 20 --> 21 25 --> 27 25 --> 26 32 --> 26 24 --> 25 28 --> 29 29 --> 32 29 --> 26 29 --> 31 29 --> 30 33 --> 0 34 --> 0 ``` <small>Digest: f74a814b00faa93fdabbe6ec9f1700e5101ea87ca13a7f69407bbe6f38ac79bb; Last Updated: 2025-10-07 04:10:19</small>
q3k added a new dependency 2025-05-24 10:22:50 +00:00
#51 Maskless Photolithography
q3k added a new dependency 2025-05-24 10:22:55 +00:00
#50 E-beam Lithography
q3k added a new dependency 2025-05-24 10:23:00 +00:00
#21 Reactive Ion Etching
q3k added a new dependency 2025-05-24 10:23:04 +00:00
#5 BOE Etching
q3k added a new dependency 2025-05-24 10:26:45 +00:00
#54 Si Thermal Oxidation
q3k added a new dependency 2025-05-24 10:47:21 +00:00
#61 Zeloof Z1 process
rahix added a new dependency 2025-05-25 01:02:50 +00:00
#62 Lithography
rahix removed a dependency 2025-05-25 01:02:56 +00:00
#50 E-beam Lithography
rahix removed a dependency 2025-05-25 01:03:00 +00:00
#51 Maskless Photolithography
rahix changed title from Pattern SiO2 to Pattern SiO₂ 2025-05-29 11:51:10 +00:00
rahix added a new dependency 2025-10-03 18:01:19 +00:00
#100 Etch fractals on wafers
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#61 Zeloof Z1 process
fafo/techtree
#100 Etch fractals on wafers
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Depends on
#5 BOE Etching
fafo/techtree
#21 Reactive Ion Etching
fafo/techtree
#54 Si Thermal Oxidation
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#62 Lithography
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Reference: fafo/techtree#53
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