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Reactive Ion Etching #21

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opened 2025-05-22 20:16:01 +00:00 by rahix · 1 comment
rahix commented 2025-05-22 20:16:01 +00:00
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rahix added the
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Needs Documentation
 labels 2025-05-22 20:16:01 +00:00
forgejo-actions commented 2025-05-22 20:16:10 +00:00
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Partial Techtree

flowchart BT

    classDef eoi fill:#fff, stroke:#000, color:#000;
    classDef dependant fill:#fff, stroke:#888, color:#888;
    classDef ultimate fill:#fff, stroke:#000, color:#000;
    classDef dep_missing fill:#fcc, stroke:#800, color:#000;
    classDef dep_assigned fill:#ffa, stroke:#a50, color:#000;
    classDef dep_completed fill:#afa, stroke:#080, color:#000;
    0:::eoi
    0["<a href='https://git.fa-fo.de/fafo/techtree/issues/21' target='_blank'>#21</a> | MISSING<br/><i>Process</i><br/><b>Reactive Ion Etching</b>"]
    1:::dep_missing
    1["<a href='https://git.fa-fo.de/fafo/techtree/issues/25' target='_blank'>#25</a> | MISSING<br/><i>Equipment</i><br/><b>Plasma Etcher</b>"]
    2:::dep_assigned
    2["<a href='https://git.fa-fo.de/fafo/techtree/issues/27' target='_blank'>#27</a> | ASSIGNED<br/><i>Equipment</i><br/><b>Technical Ventilation</b>"]
    3:::dep_assigned
    3["<a href='https://git.fa-fo.de/fafo/techtree/issues/118' target='_blank'>#118</a> | ASSIGNED<br/><i>Development</i><br/><b>Hazard Assessment</b>"]
    4:::dep_completed
    4["<a href='https://git.fa-fo.de/fafo/techtree/issues/24' target='_blank'>#24</a> | COMPLETED<br/><i>Equipment</i><br/><b>~3ph Power (below 10kW)</b>"]
    5:::dependant
    5["<a href='https://git.fa-fo.de/fafo/techtree/issues/2' target='_blank'>#2</a> | MISSING<br/><i>Process</i><br/><b>Chip Delayering</b>"]
    6:::dependant
    6["<a href='https://git.fa-fo.de/fafo/techtree/issues/53' target='_blank'>#53</a> | MISSING<br/><i>Process</i><br/><b>Pattern SiO₂</b>"]
    2 --> 3
    1 --> 4
    1 --> 2
    0 --> 1
    5 --> 0
    6 --> 0

Digest: ea6b743eee632d132a40b91086085ecb94ec421b4e6f631134ef91ea38641a5b; Last Updated: 2026-01-25 23:22:54

## Partial Techtree ```mermaid flowchart BT classDef eoi fill:#fff, stroke:#000, color:#000; classDef dependant fill:#fff, stroke:#888, color:#888; classDef ultimate fill:#fff, stroke:#000, color:#000; classDef dep_missing fill:#fcc, stroke:#800, color:#000; classDef dep_assigned fill:#ffa, stroke:#a50, color:#000; classDef dep_completed fill:#afa, stroke:#080, color:#000; 0:::eoi 0["<a href='https://git.fa-fo.de/fafo/techtree/issues/21' target='_blank'>#21</a> | MISSING<br/><i>Process</i><br/><b>Reactive Ion Etching</b>"] 1:::dep_missing 1["<a href='https://git.fa-fo.de/fafo/techtree/issues/25' target='_blank'>#25</a> | MISSING<br/><i>Equipment</i><br/><b>Plasma Etcher</b>"] 2:::dep_assigned 2["<a href='https://git.fa-fo.de/fafo/techtree/issues/27' target='_blank'>#27</a> | ASSIGNED<br/><i>Equipment</i><br/><b>Technical Ventilation</b>"] 3:::dep_assigned 3["<a href='https://git.fa-fo.de/fafo/techtree/issues/118' target='_blank'>#118</a> | ASSIGNED<br/><i>Development</i><br/><b>Hazard Assessment</b>"] 4:::dep_completed 4["<a href='https://git.fa-fo.de/fafo/techtree/issues/24' target='_blank'>#24</a> | COMPLETED<br/><i>Equipment</i><br/><b>~3ph Power (below 10kW)</b>"] 5:::dependant 5["<a href='https://git.fa-fo.de/fafo/techtree/issues/2' target='_blank'>#2</a> | MISSING<br/><i>Process</i><br/><b>Chip Delayering</b>"] 6:::dependant 6["<a href='https://git.fa-fo.de/fafo/techtree/issues/53' target='_blank'>#53</a> | MISSING<br/><i>Process</i><br/><b>Pattern SiO₂</b>"] 2 --> 3 1 --> 4 1 --> 2 0 --> 1 5 --> 0 6 --> 0 ``` <small>Digest: ea6b743eee632d132a40b91086085ecb94ec421b4e6f631134ef91ea38641a5b; Last Updated: 2026-01-25 23:22:54</small>
rahix added a new dependency 2025-05-22 20:16:19 +00:00
#2 Chip Delayering
rahix added a new dependency 2025-05-22 23:47:53 +00:00
#25 Plasma Etcher
q3k added a new dependency 2025-05-24 10:23:00 +00:00
#53 Pattern SiO₂
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#2 Chip Delayering
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#53 Pattern SiO₂
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#25 Plasma Etcher
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Reference: fafo/techtree#21
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