Tube Furnace #55

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opened 2025-05-24 10:26:08 +00:00 by q3k · 2 comments
Owner

Draft specs:

  1. 800°C - 1200°C for thermal oxidation of silicon
  2. Precise temperature ramp for process control
  3. A large enough diameter to hold at least a die at a time (but ideally something that can hold at least 100mm wafers).
Draft specs: 1. 800°C - 1200°C for thermal oxidation of silicon 2. Precise temperature ramp for process control 3. A large enough diameter to hold at least a die at a time (but ideally something that can hold at least 100mm wafers).
q3k added the
Type
Equipment
label 2025-05-24 10:26:08 +00:00

Partial Techtree

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    1["<a href='https://git.fa-fo.de/fafo/techtree/issues/54' target='_blank'>#54</a> | MISSING\n<i>Process</i>\n<b>Si Thermal Oxidation</b>"]
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    2["<a href='https://git.fa-fo.de/fafo/techtree/issues/60' target='_blank'>#60</a> | MISSING\n<i>Process</i>\n<b>Thermal diffusion doping</b>"]
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q3k added a new dependency 2025-05-24 10:26:17 +00:00
q3k added a new dependency 2025-05-24 10:44:52 +00:00
Owner

Here is a DIY tube furnace: https://www.projectsinflight.com/2023/06/14/high-temp/

I would prefer to get a properly built device but if that isn't happening, it seems we could build our own?

Here is a DIY tube furnace: https://www.projectsinflight.com/2023/06/14/high-temp/ I would prefer to get a properly built device but if that isn't happening, it seems we could build our own?
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